INTERGATED SOLUTIONS FOR
ALD/CVD HIGH PURITY PRECURSOR

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About Us

Working with Taiwan’s precursor leader, Nanmat Technology, we have been offering products for thin film deposition in pan-semiconductor manufacturing industry since 2012. It's our mission to ensure our clients' success by enabling their production yield improvement and COO (Cost of Ownership) reduction.

We not only bring clients with electronic-grade, high-purity, standard or tailored CVD (Chemical Vapor Deposition) and ALD (Atomic Layer Deposition) precursors, but also provide canister customization and smart canister with advanced level sensor. To help our clients to stay ahead of the game, we concurrently develop innovative materials that ease their transition to the next generation production.

Our Services

DEPOSTION MATERIAL

Full line electronic materials - your partner in high k, metal gate and low k film deposition.

PRECURSOR CONTAINER

We source the optimal high quality stainless stell canister and tailored to meet your needs.

LIQUID LEVEL SENSOR

Ultra sound enabled liquid level sensor with fine tuned algorithm for precision measurement.

Chemicals

High K, Low K thin film deposition

Full Line Service

From synthesis, purification, analysis, manufacturing to packaging, transfill; or joint development of new material to cater to each customer’s needs

Quality Control

Equipped with full-line quality inspection tools. Awarded with BSI ISO 45001: 2018/ 14001: 2015; last certified in March 2024.

Nanmat CVD ALD Precursor Lab
TDMAT 1.2 Litter Canister

Custom Package

Canister ranging from 1.2-liter to 53-galon, we offer spec-compatible canister to drop in replace the existing ones.

Customer Recognition

Nanmat Technology received Excellent Performance Awards from the global leading foundry in 2020 and 2021

TSMC Best Supplier Recognition

Application

Application Product Name
Dielectrics PMD/IMD >6N
Low K Dielectrics • 4MS • OMCATS • DMDMOS
High K Dielectrics

• TAETO (Ta2O5 Precursor )
• TEMAH • HfCl4 (ALD HfO2 Precursor)
• TEMAZ (ALD ZrO2 Precursor)
• TMA (Al2O3 Precursor)

Metal Gate and
Interconnect Metal		 • TDMAT ( TiN Precursor )
• TiCl4 ( Ti /TiN Precursor )
• PDMAT ( TaN Precursor)
• CCTBA (Co Precursor )

Low-Temp Nitride/Oxide • HCDS • 3DMAS • BTBAS
Dopants • Trans DCE

Note：All precursors can also be modified with many other functional groups in IC grades (>6N)

Ultra Sound Level Sensor

The system consists of a sensor probe and a control unit with a compact design. It senses the presence of liquid in the container based on the distribution of the ultrasonic field. The probe is separated from the control unit, does not require calibration, and is easy to install.

The probe is sealed in a stainless steel sleeve with no moving parts, longer life cycle while avoiding contaminateing the chemical. When in use, it does not need to be calibrated according to the density, dielectric constant, type, color and viscosity of the chemical to be tested. The probe is made of 316L stainless steel and is connected to the container through a ½” or ¾” VCR interface to prevent chemical leakage. The special process and algorithm design offers ±1.5 mm accuracy measurement. It can greatly increase the utilization rate of materials with low risk.

Ultra-Sound-Level-Sensor-Semiconductor-ALD-CVD-Precursor

Ultra Sound Liquid Level Sensor :
Precisely monitor your chemical to the last drop!